Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing
Journal of Electroceramics
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2014
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sg-nus-scholar.10635-987302023-08-29T22:25:57Z Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing Li, Q. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. Ong, C.K. PHYSICS High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering Journal of Electroceramics 16 4 517-521 JOELF 2014-10-16T09:50:45Z 2014-10-16T09:50:45Z 2006-07 Conference Paper Li, Q., Wang, S.J., Wang, W.D., Chi, D.Z., Huan, A.C.H., Ong, C.K. (2006-07). Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing. Journal of Electroceramics 16 (4) : 517-521. ScholarBank@NUS Repository. 13853449 http://scholarbank.nus.edu.sg/handle/10635/98730 000241750700050 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| topic |
High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering |
| spellingShingle |
High-k dielectric thin films Metal-oxide-semiconductor Rapid thermal annealing UHV sputtering Li, Q. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. Ong, C.K. Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| description |
Journal of Electroceramics |
| author2 |
PHYSICS |
| author_facet |
PHYSICS Li, Q. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. Ong, C.K. |
| format |
Conference or Workshop Item |
| author |
Li, Q. Wang, S.J. Wang, W.D. Chi, D.Z. Huan, A.C.H. Ong, C.K. |
| author_sort |
Li, Q. |
| title |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| title_short |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| title_full |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| title_fullStr |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| title_full_unstemmed |
Growth and characterization of UHV sputtering HfO2 film by plasma oxidation and low temperature annealing |
| title_sort |
growth and characterization of uhv sputtering hfo2 film by plasma oxidation and low temperature annealing |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/98730 |
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1776260224719519744 |