A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography

10.1088/0957-0233/17/8/025

Saved in:
Bibliographic Details
Main Authors: Hu, N., Tay, A., Tsai, K.-Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/54134
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-54134
record_format dspace
spelling sg-nus-scholar.10635-541342023-10-27T09:05:56Z A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography Hu, N. Tay, A. Tsai, K.-Y. ELECTRICAL & COMPUTER ENGINEERING Fault detection In situ estimation Photoresist processing Semiconductor manufacturing 10.1088/0957-0233/17/8/025 Measurement Science and Technology 17 8 2233-2240 MSTCE 2014-06-16T09:27:44Z 2014-06-16T09:27:44Z 2006-08-01 Article Hu, N., Tay, A., Tsai, K.-Y. (2006-08-01). A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography. Measurement Science and Technology 17 (8) : 2233-2240. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-0233/17/8/025 09570233 http://scholarbank.nus.edu.sg/handle/10635/54134 000239774300027 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Fault detection
In situ estimation
Photoresist processing
Semiconductor manufacturing
spellingShingle Fault detection
In situ estimation
Photoresist processing
Semiconductor manufacturing
Hu, N.
Tay, A.
Tsai, K.-Y.
A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
description 10.1088/0957-0233/17/8/025
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Hu, N.
Tay, A.
Tsai, K.-Y.
format Article
author Hu, N.
Tay, A.
Tsai, K.-Y.
author_sort Hu, N.
title A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
title_short A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
title_full A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
title_fullStr A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
title_full_unstemmed A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
title_sort fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/54134
_version_ 1781411939988013056