A fast in situ approach to estimating wafer warpage profile during thermal processing in microlithography
10.1088/0957-0233/17/8/025
Saved in:
Main Authors: | Hu, N., Tay, A., Tsai, K.-Y. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/54134 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Fault detection and estimation of wafer warpage profile during thermal processing in microlithography
by: Tay, A., et al.
Published: (2014) -
In situ fault detection of wafer warpage in microlithography
by: Ho, W.K., et al.
Published: (2014) -
Detection of Wafer warpages during thermal processing in microlithography
by: Ho, W.K., et al.
Published: (2014) -
Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography
by: Tay, A., et al.
Published: (2014) -
Temperature regulation and in-situ fault detection of wafer warpage
by: CHEN WEI
Published: (2010)