An air-flow based wafer bake system for improved temperature uniformity

10.1016/j.jprocont.2008.04.021

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Bibliographic Details
Main Authors:	Wang, L., Loh, A.P., Gong, Z.M., Chow, S.L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Microlithography Post exposure bake (PEB) Temperature uniformity Wafer-baking process
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/54986
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-54986
record_format	dspace
spelling	sg-nus-scholar.10635-549862024-11-11T13:23:33Z An air-flow based wafer bake system for improved temperature uniformity Wang, L. Loh, A.P. Gong, Z.M. Chow, S.L. ELECTRICAL & COMPUTER ENGINEERING Microlithography Post exposure bake (PEB) Temperature uniformity Wafer-baking process 10.1016/j.jprocont.2008.04.021 Journal of Process Control 18 10 931-936 JPCOE 2014-06-17T02:37:50Z 2014-06-17T02:37:50Z 2008-12 Article Wang, L., Loh, A.P., Gong, Z.M., Chow, S.L. (2008-12). An air-flow based wafer bake system for improved temperature uniformity. Journal of Process Control 18 (10) : 931-936. ScholarBank@NUS Repository. https://doi.org/10.1016/j.jprocont.2008.04.021 09591524 http://scholarbank.nus.edu.sg/handle/10635/54986 000261897200004 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Microlithography Post exposure bake (PEB) Temperature uniformity Wafer-baking process
spellingShingle	Microlithography Post exposure bake (PEB) Temperature uniformity Wafer-baking process Wang, L. Loh, A.P. Gong, Z.M. Chow, S.L. An air-flow based wafer bake system for improved temperature uniformity
description	10.1016/j.jprocont.2008.04.021
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wang, L. Loh, A.P. Gong, Z.M. Chow, S.L.
format	Article
author	Wang, L. Loh, A.P. Gong, Z.M. Chow, S.L.
author_sort	Wang, L.
title	An air-flow based wafer bake system for improved temperature uniformity
title_short	An air-flow based wafer bake system for improved temperature uniformity
title_full	An air-flow based wafer bake system for improved temperature uniformity
title_fullStr	An air-flow based wafer bake system for improved temperature uniformity
title_full_unstemmed	An air-flow based wafer bake system for improved temperature uniformity
title_sort	air-flow based wafer bake system for improved temperature uniformity
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/54986
_version_	1821185345756069888

An air-flow based wafer bake system for improved temperature uniformity

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