Effects of annealing on the valence band offsets between hafnium aluminate and silicon

10.1063/1.2982085

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Bibliographic Details
Main Authors: Chiam, S.Y., Chim, W.K., Ren, Y., Pi, C., Pan, J.S., Huan, A.C.H., Wang, S.J., Zhang, J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55772
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Institution: National University of Singapore