Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides

10.1063/1.1566460

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Main Authors: Xu, M., Tan, C., Li, M.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55972
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-559722024-11-10T17:47:44Z Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides Xu, M. Tan, C. Li, M. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1566460 Applied Physics Letters 82 15 2482-2484 APPLA 2014-06-17T02:49:15Z 2014-06-17T02:49:15Z 2003-04-14 Article Xu, M., Tan, C., Li, M. (2003-04-14). Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides. Applied Physics Letters 82 (15) : 2482-2484. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1566460 00036951 http://scholarbank.nus.edu.sg/handle/10635/55972 000182104900038 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1063/1.1566460
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Xu, M.
Tan, C.
Li, M.
format Article
author Xu, M.
Tan, C.
Li, M.
spellingShingle Xu, M.
Tan, C.
Li, M.
Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
author_sort Xu, M.
title Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
title_short Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
title_full Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
title_fullStr Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
title_full_unstemmed Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
title_sort extended arrhenius law of time-to-breakdown of ultrathin gate oxides
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/55972
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