Extended Arrhenius law of time-to-breakdown of ultrathin gate oxides
10.1063/1.1566460
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Main Authors: | Xu, M., Tan, C., Li, M. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55972 |
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Institution: | National University of Singapore |
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