Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching

Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching

10.1021/cm101121c

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Bibliographic Details
Main Authors: Huang, J., Chiam, S.Y., Tan, H.H., Wang, S., Chim, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55991
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/55991

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