Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching

10.1021/cm101121c

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Main Authors:	Huang, J., Chiam, S.Y., Tan, H.H., Wang, S., Chim, W.K.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/55991
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-55991
record_format	dspace
spelling	sg-nus-scholar.10635-559912023-10-29T23:05:24Z Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching Huang, J. Chiam, S.Y. Tan, H.H. Wang, S. Chim, W.K. ELECTRICAL & COMPUTER ENGINEERING 10.1021/cm101121c Chemistry of Materials 22 13 4111-4116 CMATE 2014-06-17T02:49:27Z 2014-06-17T02:49:27Z 2010-07-13 Article Huang, J., Chiam, S.Y., Tan, H.H., Wang, S., Chim, W.K. (2010-07-13). Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching. Chemistry of Materials 22 (13) : 4111-4116. ScholarBank@NUS Repository. https://doi.org/10.1021/cm101121c 08974756 http://scholarbank.nus.edu.sg/handle/10635/55991 000279389200036 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1021/cm101121c
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Huang, J. Chiam, S.Y. Tan, H.H. Wang, S. Chim, W.K.
format	Article
author	Huang, J. Chiam, S.Y. Tan, H.H. Wang, S. Chim, W.K.
spellingShingle	Huang, J. Chiam, S.Y. Tan, H.H. Wang, S. Chim, W.K. Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
author_sort	Huang, J.
title	Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
title_short	Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
title_full	Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
title_fullStr	Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
title_full_unstemmed	Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
title_sort	fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/55991
_version_	1781781092649402368

Fabrication of silicon nanowires with precise diameter control using metal nanodot arrays as a hard mask blocking material in chemical etching

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