Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon

Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon

10.1002/adfm.201000498

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Bibliographic Details
Main Authors: Ren, Y., Chim, W.K., Chiam, S.Y., Huang, J.Q., Pi, C., Pan, J.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56082
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/56082

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