Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
10.1002/adfm.201000498
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Main Authors: | Ren, Y., Chim, W.K., Chiam, S.Y., Huang, J.Q., Pi, C., Pan, J.S. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56082 |
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Institution: | National University of Singapore |
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