Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon

10.1002/adfm.201000498

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Bibliographic Details
Main Authors:	Ren, Y., Chim, W.K., Chiam, S.Y., Huang, J.Q., Pi, C., Pan, J.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/56082
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-56082
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spelling	sg-nus-scholar.10635-560822023-10-25T21:22:16Z Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon Ren, Y. Chim, W.K. Chiam, S.Y. Huang, J.Q. Pi, C. Pan, J.S. ELECTRICAL & COMPUTER ENGINEERING 10.1002/adfm.201000498 Advanced Functional Materials 20 19 3336-3342 AFMDC 2014-06-17T02:50:32Z 2014-06-17T02:50:32Z 2010-10-08 Article Ren, Y., Chim, W.K., Chiam, S.Y., Huang, J.Q., Pi, C., Pan, J.S. (2010-10-08). Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon. Advanced Functional Materials 20 (19) : 3336-3342. ScholarBank@NUS Repository. https://doi.org/10.1002/adfm.201000498 1616301X http://scholarbank.nus.edu.sg/handle/10635/56082 000283386400017 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1002/adfm.201000498
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ren, Y. Chim, W.K. Chiam, S.Y. Huang, J.Q. Pi, C. Pan, J.S.
format	Article
author	Ren, Y. Chim, W.K. Chiam, S.Y. Huang, J.Q. Pi, C. Pan, J.S.
spellingShingle	Ren, Y. Chim, W.K. Chiam, S.Y. Huang, J.Q. Pi, C. Pan, J.S. Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
author_sort	Ren, Y.
title	Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
title_short	Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
title_full	Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
title_fullStr	Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
title_full_unstemmed	Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
title_sort	formation of nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/56082
_version_	1781781109031305216

Formation of Nickel oxide nanotubes with uniform wall thickness by low-temperature thermal oxidation through understanding the limiting effect of vacancy diffusion and the kirkendall phenomenon

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