Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current
10.1063/1.1516266
Saved in:
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Article |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/56677 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-56677 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-566772023-10-27T08:43:20Z Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current Chim, W.K. Tan, Y.N. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.1516266 Journal of Applied Physics 92 11 6636-6645 JAPIA 2014-06-17T02:57:19Z 2014-06-17T02:57:19Z 2002-12-01 Article Chim, W.K., Tan, Y.N. (2002-12-01). Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current. Journal of Applied Physics 92 (11) : 6636-6645. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1516266 00218979 http://scholarbank.nus.edu.sg/handle/10635/56677 000179206600039 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
10.1063/1.1516266 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Chim, W.K. Tan, Y.N. |
| format |
Article |
| author |
Chim, W.K. Tan, Y.N. |
| spellingShingle |
Chim, W.K. Tan, Y.N. Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| author_sort |
Chim, W.K. |
| title |
Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| title_short |
Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| title_full |
Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| title_fullStr |
Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| title_full_unstemmed |
Modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| title_sort |
modeling the trap generation and relaxation effects in thin oxides under unipolar and bipolar high-field impulse stressing using stress-induced leakage current |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/56677 |
| _version_ |
1781781232118398976 |