Performance-based optical proximity correction methodology

Performance-based optical proximity correction methodology

10.1109/TCAD.2009.2032360

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Bibliographic Details
Main Authors: Teh, S.-H., Heng, C.-H., Tay, A.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Circuit performance
Device performance
Lithography
Mask design
Optical proximity correction (OPC)
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57041
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/57041

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