OPC mask simplification using over-designed timing slack of standard cells

OPC mask simplification using over-designed timing slack of standard cells

10.1117/12.2018921

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Bibliographic Details
Main Authors: Qu, Y., Heng, C.H., Tay, A., Lee, T.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Circuit performance
Design for manufacturability (DFM)
Mask
Optical proximity correction (OPC)
Timing slack
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71264
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/71264

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