OPC mask simplification using over-designed timing slack of standard cells

• Main Authors: Qu, Y., Heng, C.H., Tay, A., Lee, T.H.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Circuit performance; Design for manufacturability (DFM); Mask; Optical proximity correction (OPC); Timing slack
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/71264
• Institution: National University of Singapore

10.1117/12.2018921