RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing

10.1109/TIM.2007.910097

Saved in:
Bibliographic Details
Main Authors: Tan, W.W., Li, R.F.Y., Loh, A.P., Ho, W.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/57322
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-57322
record_format dspace
spelling sg-nus-scholar.10635-573222023-10-25T23:35:24Z RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing Tan, W.W. Li, R.F.Y. Loh, A.P. Ho, W.K. ELECTRICAL & COMPUTER ENGINEERING In-situ temperature measurement Loop current step response (LCSR) test Measurement accuracy Out-of-contact fault Post-exposure bake (PEB) 10.1109/TIM.2007.910097 IEEE Transactions on Instrumentation and Measurement 57 2 406-412 IEIMA 2014-06-17T03:04:52Z 2014-06-17T03:04:52Z 2008-02 Article Tan, W.W., Li, R.F.Y., Loh, A.P., Ho, W.K. (2008-02). RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing. IEEE Transactions on Instrumentation and Measurement 57 (2) : 406-412. ScholarBank@NUS Repository. https://doi.org/10.1109/TIM.2007.910097 00189456 http://scholarbank.nus.edu.sg/handle/10635/57322 000252338000024 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic In-situ temperature measurement
Loop current step response (LCSR) test
Measurement accuracy
Out-of-contact fault
Post-exposure bake (PEB)
spellingShingle In-situ temperature measurement
Loop current step response (LCSR) test
Measurement accuracy
Out-of-contact fault
Post-exposure bake (PEB)
Tan, W.W.
Li, R.F.Y.
Loh, A.P.
Ho, W.K.
RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
description 10.1109/TIM.2007.910097
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Tan, W.W.
Li, R.F.Y.
Loh, A.P.
Ho, W.K.
format Article
author Tan, W.W.
Li, R.F.Y.
Loh, A.P.
Ho, W.K.
author_sort Tan, W.W.
title RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
title_short RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
title_full RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
title_fullStr RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
title_full_unstemmed RTD response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
title_sort rtd response time estimation in the presence of temperature variations and its application to semiconductor manufacturing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/57322
_version_ 1781781387925258240