The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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Bibliographic Details
Main Authors:	Lu, Y.F., Yu, J.J., Choi, W.K.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Far-ultraviolet radiation Interface Interface structure and roughness Laser surface modification Microstructure Silicon-dioxide film Silicon-dioxide/silicon system
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/62860
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-62860
record_format	dspace
spelling	sg-nus-scholar.10635-628602015-01-17T08:12:13Z The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates Lu, Y.F. Yu, J.J. Choi, W.K. ELECTRICAL ENGINEERING Far-ultraviolet radiation Interface Interface structure and roughness Laser surface modification Microstructure Silicon-dioxide film Silicon-dioxide/silicon system Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 6 A 3471-3474 JAPND 2014-06-17T06:55:41Z 2014-06-17T06:55:41Z 1998-06 Article Lu, Y.F.,Yu, J.J.,Choi, W.K. (1998-06). The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 37 (6 A) : 3471-3474. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/62860 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Far-ultraviolet radiation Interface Interface structure and roughness Laser surface modification Microstructure Silicon-dioxide film Silicon-dioxide/silicon system
spellingShingle	Far-ultraviolet radiation Interface Interface structure and roughness Laser surface modification Microstructure Silicon-dioxide film Silicon-dioxide/silicon system Lu, Y.F. Yu, J.J. Choi, W.K. The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
description	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Lu, Y.F. Yu, J.J. Choi, W.K.
format	Article
author	Lu, Y.F. Yu, J.J. Choi, W.K.
author_sort	Lu, Y.F.
title	The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
title_short	The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
title_full	The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
title_fullStr	The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
title_full_unstemmed	The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
title_sort	excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/62860
_version_	1681085853067116544

The excimer laser-induced ripple structures at the interfaces of silicon-dioxide/silicon substrates

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