True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films

Applied Physics Letters

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Bibliographic Details
Main Authors: Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/62895
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spelling sg-nus-scholar.10635-628952023-08-22T08:01:02Z True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. ELECTRICAL ENGINEERING Applied Physics Letters 63 16 2240-2242 2014-06-17T06:56:03Z 2014-06-17T06:56:03Z 1993 Article Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B. (1993). True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films. Applied Physics Letters 63 (16) : 2240-2242. ScholarBank@NUS Repository. 00036951 http://scholarbank.nus.edu.sg/handle/10635/62895 A1993MC05000026 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Applied Physics Letters
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Lau, W.S.
Chan, D.S.H.
Phang, J.C.H.
Chow, K.W.
Pey, K.S.
Lim, Y.P.
Cronquist, B.
format Article
author Lau, W.S.
Chan, D.S.H.
Phang, J.C.H.
Chow, K.W.
Pey, K.S.
Lim, Y.P.
Cronquist, B.
spellingShingle Lau, W.S.
Chan, D.S.H.
Phang, J.C.H.
Chow, K.W.
Pey, K.S.
Lim, Y.P.
Cronquist, B.
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
author_sort Lau, W.S.
title True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
title_short True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
title_full True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
title_fullStr True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
title_full_unstemmed True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
title_sort true oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/62895
_version_ 1775628032423231488