True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
Applied Physics Letters
Saved in:
Main Authors: | , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/62895 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
id |
sg-nus-scholar.10635-62895 |
---|---|
record_format |
dspace |
spelling |
sg-nus-scholar.10635-628952023-08-22T08:01:02Z True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. ELECTRICAL ENGINEERING Applied Physics Letters 63 16 2240-2242 2014-06-17T06:56:03Z 2014-06-17T06:56:03Z 1993 Article Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B. (1993). True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films. Applied Physics Letters 63 (16) : 2240-2242. ScholarBank@NUS Repository. 00036951 http://scholarbank.nus.edu.sg/handle/10635/62895 A1993MC05000026 Scopus |
institution |
National University of Singapore |
building |
NUS Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NUS Library |
collection |
ScholarBank@NUS |
description |
Applied Physics Letters |
author2 |
ELECTRICAL ENGINEERING |
author_facet |
ELECTRICAL ENGINEERING Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. |
format |
Article |
author |
Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. |
spellingShingle |
Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
author_sort |
Lau, W.S. |
title |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
title_short |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
title_full |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
title_fullStr |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
title_full_unstemmed |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
title_sort |
true oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/62895 |
_version_ |
1775628032423231488 |