True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films

True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films

10.1063/1.110539

Saved in:
Bibliographic Details
Main Authors: Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/81308
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/81308

Similar Items