True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films
10.1063/1.110539
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sg-nus-scholar.10635-813082023-10-30T22:53:04Z True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. ELECTRICAL ENGINEERING 10.1063/1.110539 Applied Physics Letters 63 16 2240-2242 2014-10-07T03:06:55Z 2014-10-07T03:06:55Z 1993 Article Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Cronquist, B. (1993). True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films. Applied Physics Letters 63 (16) : 2240-2242. ScholarBank@NUS Repository. https://doi.org/10.1063/1.110539 00036951 http://scholarbank.nus.edu.sg/handle/10635/81308 A1993MC05000026 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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| description |
10.1063/1.110539 |
| author2 |
ELECTRICAL ENGINEERING |
| author_facet |
ELECTRICAL ENGINEERING Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. |
| format |
Article |
| author |
Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. |
| spellingShingle |
Lau, W.S. Chan, D.S.H. Phang, J.C.H. Chow, K.W. Pey, K.S. Lim, Y.P. Cronquist, B. True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| author_sort |
Lau, W.S. |
| title |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| title_short |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| title_full |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| title_fullStr |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| title_full_unstemmed |
True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| title_sort |
true oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/81308 |
| _version_ |
1781783982729330688 |