Double-layer inorganic antireflective system for KrF lithography

10.1116/1.591163

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Bibliographic Details
Main Authors: Xu, M., Ko, T.-M.
Other Authors: CHEMICAL & ENVIRONMENTAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/66532
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Institution: National University of Singapore