Double-layer inorganic antireflective system for KrF lithography
10.1116/1.591163
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Main Authors: | Xu, M., Ko, T.-M. |
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Other Authors: | CHEMICAL & ENVIRONMENTAL ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/66532 |
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Institution: | National University of Singapore |
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