Double-layer inorganic antireflective system for KrF lithography

10.1116/1.591163

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Main Authors: Xu, M., Ko, T.-M.
Other Authors: CHEMICAL & ENVIRONMENTAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/66532
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-665322023-08-07T08:29:52Z Double-layer inorganic antireflective system for KrF lithography Xu, M. Ko, T.-M. CHEMICAL & ENVIRONMENTAL ENGINEERING 10.1116/1.591163 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 1 127-135 JVTBD 2014-06-17T08:31:27Z 2014-06-17T08:31:27Z 2000-01 Article Xu, M., Ko, T.-M. (2000-01). Double-layer inorganic antireflective system for KrF lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 (1) : 127-135. ScholarBank@NUS Repository. https://doi.org/10.1116/1.591163 10711023 http://scholarbank.nus.edu.sg/handle/10635/66532 000085375600026 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1116/1.591163
author2 CHEMICAL & ENVIRONMENTAL ENGINEERING
author_facet CHEMICAL & ENVIRONMENTAL ENGINEERING
Xu, M.
Ko, T.-M.
format Article
author Xu, M.
Ko, T.-M.
spellingShingle Xu, M.
Ko, T.-M.
Double-layer inorganic antireflective system for KrF lithography
author_sort Xu, M.
title Double-layer inorganic antireflective system for KrF lithography
title_short Double-layer inorganic antireflective system for KrF lithography
title_full Double-layer inorganic antireflective system for KrF lithography
title_fullStr Double-layer inorganic antireflective system for KrF lithography
title_full_unstemmed Double-layer inorganic antireflective system for KrF lithography
title_sort double-layer inorganic antireflective system for krf lithography
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/66532
_version_ 1776256990385799168