Double-layer inorganic antireflective system for KrF lithography
10.1116/1.591163
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sg-nus-scholar.10635-665322023-08-07T08:29:52Z Double-layer inorganic antireflective system for KrF lithography Xu, M. Ko, T.-M. CHEMICAL & ENVIRONMENTAL ENGINEERING 10.1116/1.591163 Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 1 127-135 JVTBD 2014-06-17T08:31:27Z 2014-06-17T08:31:27Z 2000-01 Article Xu, M., Ko, T.-M. (2000-01). Double-layer inorganic antireflective system for KrF lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 18 (1) : 127-135. ScholarBank@NUS Repository. https://doi.org/10.1116/1.591163 10711023 http://scholarbank.nus.edu.sg/handle/10635/66532 000085375600026 Scopus |
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10.1116/1.591163 |
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CHEMICAL & ENVIRONMENTAL ENGINEERING |
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CHEMICAL & ENVIRONMENTAL ENGINEERING Xu, M. Ko, T.-M. |
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Xu, M. Ko, T.-M. |
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Xu, M. Ko, T.-M. Double-layer inorganic antireflective system for KrF lithography |
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Xu, M. |
title |
Double-layer inorganic antireflective system for KrF lithography |
title_short |
Double-layer inorganic antireflective system for KrF lithography |
title_full |
Double-layer inorganic antireflective system for KrF lithography |
title_fullStr |
Double-layer inorganic antireflective system for KrF lithography |
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Double-layer inorganic antireflective system for KrF lithography |
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double-layer inorganic antireflective system for krf lithography |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/66532 |
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