Dependence of substrate orientation and etching conditions on the formation of Si nanowires

10.1109/ESCINANO.2010.5700956

Saved in:

Bibliographic Details
Main Authors:	Theng, T.L., Hui, H.M., Sheng, C.T., Soon, O.C., Sun, M.T., Qixun, W., Beng, S.C., Jin, C.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/69809
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-69809
record_format	dspace
spelling	sg-nus-scholar.10635-698092015-03-03T04:35:01Z Dependence of substrate orientation and etching conditions on the formation of Si nanowires Theng, T.L. Hui, H.M. Sheng, C.T. Soon, O.C. Sun, M.T. Qixun, W. Beng, S.C. Jin, C.S. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ESCINANO.2010.5700956 2010 International Conference on Enabling Science and Nanotechnology, ESciNano 2010 - Proceedings - 2014-06-19T03:04:53Z 2014-06-19T03:04:53Z 2010 Conference Paper Theng, T.L.,Hui, H.M.,Sheng, C.T.,Soon, O.C.,Sun, M.T.,Qixun, W.,Beng, S.C.,Jin, C.S. (2010). Dependence of substrate orientation and etching conditions on the formation of Si nanowires. 2010 International Conference on Enabling Science and Nanotechnology, ESciNano 2010 - Proceedings : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ESCINANO.2010.5700956" target="_blank">https://doi.org/10.1109/ESCINANO.2010.5700956</a> 9781424488544 http://scholarbank.nus.edu.sg/handle/10635/69809 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/ESCINANO.2010.5700956
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Theng, T.L. Hui, H.M. Sheng, C.T. Soon, O.C. Sun, M.T. Qixun, W. Beng, S.C. Jin, C.S.
format	Conference or Workshop Item
author	Theng, T.L. Hui, H.M. Sheng, C.T. Soon, O.C. Sun, M.T. Qixun, W. Beng, S.C. Jin, C.S.
spellingShingle	Theng, T.L. Hui, H.M. Sheng, C.T. Soon, O.C. Sun, M.T. Qixun, W. Beng, S.C. Jin, C.S. Dependence of substrate orientation and etching conditions on the formation of Si nanowires
author_sort	Theng, T.L.
title	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_short	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_full	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_fullStr	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_full_unstemmed	Dependence of substrate orientation and etching conditions on the formation of Si nanowires
title_sort	dependence of substrate orientation and etching conditions on the formation of si nanowires
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/69809
_version_	1681087081706684416

Dependence of substrate orientation and etching conditions on the formation of Si nanowires

Similar Items