Dependence of substrate orientation and etching conditions on the formation of Si nanowires

10.1109/ESCINANO.2010.5700956

Saved in:
Bibliographic Details
Main Authors: Theng, T.L., Hui, H.M., Sheng, C.T., Soon, O.C., Sun, M.T., Qixun, W., Beng, S.C., Jin, C.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69809
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore