Dependence of substrate orientation and etching conditions on the formation of Si nanowires

• Main Authors: Theng, T.L., Hui, H.M., Sheng, C.T., Soon, O.C., Sun, M.T., Qixun, W., Beng, S.C., Jin, C.S.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/69809
• Institution: National University of Singapore

10.1109/ESCINANO.2010.5700956