Enhancing CMOS transistor performance using lattice-mismatched materials in source/drain regions

Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest

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書目詳細資料
主要作者: Yeo, Y.-C.
其他作者: ELECTRICAL & COMPUTER ENGINEERING
格式: Conference or Workshop Item
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/70189
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機構: National University of Singapore
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總結:Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest