Interface engineering for high-k/Ge gate stack

10.1109/ICSICT.2008.4734778

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Bibliographic Details
Main Authors: Xie, R., Zhu, C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70647
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-706472015-03-03T09:04:36Z Interface engineering for high-k/Ge gate stack Xie, R. Zhu, C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ICSICT.2008.4734778 International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 1252-1255 2014-06-19T03:14:33Z 2014-06-19T03:14:33Z 2008 Conference Paper Xie, R.,Zhu, C. (2008). Interface engineering for high-k/Ge gate stack. International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT : 1252-1255. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ICSICT.2008.4734778" target="_blank">https://doi.org/10.1109/ICSICT.2008.4734778</a> 9781424421855 http://scholarbank.nus.edu.sg/handle/10635/70647 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/ICSICT.2008.4734778
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Xie, R.
Zhu, C.
format Conference or Workshop Item
author Xie, R.
Zhu, C.
spellingShingle Xie, R.
Zhu, C.
Interface engineering for high-k/Ge gate stack
author_sort Xie, R.
title Interface engineering for high-k/Ge gate stack
title_short Interface engineering for high-k/Ge gate stack
title_full Interface engineering for high-k/Ge gate stack
title_fullStr Interface engineering for high-k/Ge gate stack
title_full_unstemmed Interface engineering for high-k/Ge gate stack
title_sort interface engineering for high-k/ge gate stack
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70647
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