High-k gate stack formation on strained SiGe substrate for MOSFET applications

10.1149/1.2778370

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Bibliographic Details
Main Authors: Zhu, C., Li, M.F., Huang, J., Fu, J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70479
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Institution: National University of Singapore