High-k gate stack formation on strained SiGe substrate for MOSFET applications
10.1149/1.2778370
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sg-nus-scholar.10635-704792015-01-17T04:30:48Z High-k gate stack formation on strained SiGe substrate for MOSFET applications Zhu, C. Li, M.F. Huang, J. Fu, J. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2778370 ECS Transactions 11 6 115-123 2014-06-19T03:12:36Z 2014-06-19T03:12:36Z 2007 Conference Paper Zhu, C.,Li, M.F.,Huang, J.,Fu, J. (2007). High-k gate stack formation on strained SiGe substrate for MOSFET applications. ECS Transactions 11 (6) : 115-123. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.2778370" target="_blank">https://doi.org/10.1149/1.2778370</a> 9781566775724 19385862 http://scholarbank.nus.edu.sg/handle/10635/70479 NOT_IN_WOS Scopus |
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10.1149/1.2778370 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Zhu, C. Li, M.F. Huang, J. Fu, J. |
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Conference or Workshop Item |
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Zhu, C. Li, M.F. Huang, J. Fu, J. |
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Zhu, C. Li, M.F. Huang, J. Fu, J. High-k gate stack formation on strained SiGe substrate for MOSFET applications |
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Zhu, C. |
title |
High-k gate stack formation on strained SiGe substrate for MOSFET applications |
title_short |
High-k gate stack formation on strained SiGe substrate for MOSFET applications |
title_full |
High-k gate stack formation on strained SiGe substrate for MOSFET applications |
title_fullStr |
High-k gate stack formation on strained SiGe substrate for MOSFET applications |
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High-k gate stack formation on strained SiGe substrate for MOSFET applications |
title_sort |
high-k gate stack formation on strained sige substrate for mosfet applications |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/70479 |
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