High-k gate stack formation on strained SiGe substrate for MOSFET applications

10.1149/1.2778370

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Bibliographic Details
Main Authors: Zhu, C., Li, M.F., Huang, J., Fu, J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70479
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-704792015-01-17T04:30:48Z High-k gate stack formation on strained SiGe substrate for MOSFET applications Zhu, C. Li, M.F. Huang, J. Fu, J. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2778370 ECS Transactions 11 6 115-123 2014-06-19T03:12:36Z 2014-06-19T03:12:36Z 2007 Conference Paper Zhu, C.,Li, M.F.,Huang, J.,Fu, J. (2007). High-k gate stack formation on strained SiGe substrate for MOSFET applications. ECS Transactions 11 (6) : 115-123. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.2778370" target="_blank">https://doi.org/10.1149/1.2778370</a> 9781566775724 19385862 http://scholarbank.nus.edu.sg/handle/10635/70479 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1149/1.2778370
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Zhu, C.
Li, M.F.
Huang, J.
Fu, J.
format Conference or Workshop Item
author Zhu, C.
Li, M.F.
Huang, J.
Fu, J.
spellingShingle Zhu, C.
Li, M.F.
Huang, J.
Fu, J.
High-k gate stack formation on strained SiGe substrate for MOSFET applications
author_sort Zhu, C.
title High-k gate stack formation on strained SiGe substrate for MOSFET applications
title_short High-k gate stack formation on strained SiGe substrate for MOSFET applications
title_full High-k gate stack formation on strained SiGe substrate for MOSFET applications
title_fullStr High-k gate stack formation on strained SiGe substrate for MOSFET applications
title_full_unstemmed High-k gate stack formation on strained SiGe substrate for MOSFET applications
title_sort high-k gate stack formation on strained sige substrate for mosfet applications
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/70479
_version_ 1681087207204454400