Schottky source/drain MOSFETs on SiGe on insulator with high-K gate dielectric and TaN gate electrode

Extended Abstracts of the Sixth International Workshop on Junction Technology, IWJT '06

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Bibliographic Details
Main Authors: Gao, F., Li, R., Chi, D.Z., Balakumar, S., Tung, C.-H., Lee, S.J.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84159
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Institution: National University of Singapore