Gate dielectrics on strained-Si/SiGe heterolayers

10.1016/j.sse.2004.02.014

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Bibliographic Details
Main Authors: Maiti, C.K., Samanta, S.K., Chatterjee, S., Dalapati, G.K., Bera, L.K.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82399
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Institution: National University of Singapore