Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth

Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth

Digests of the Intermag Conference

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Bibliographic Details
Main Authors: Guo, Z.B., Li, K.B., Han, G.C., Liu, Z.Y., Luo, P., Wu, Y.H.
Other Authors: PHYSICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/70862
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Institution: National University of Singapore
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Summary:Digests of the Intermag Conference

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