Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth

• Main Authors: Guo, Z.B., Li, K.B., Han, G.C., Liu, Z.Y., Luo, P., Wu, Y.H.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/70862
• Institution: National University of Singapore

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