Real-time monitoring of photoresist thickness contour in microlithography

10.1109/ISSM.2006.4493108

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Bibliographic Details
Main Authors:	Ho, W.K., Chen, X., Wu, X., Tay, A.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/71568
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-71568
record_format	dspace
spelling	sg-nus-scholar.10635-715682015-02-17T03:11:09Z Real-time monitoring of photoresist thickness contour in microlithography Ho, W.K. Chen, X. Wu, X. Tay, A. ELECTRICAL & COMPUTER ENGINEERING 10.1109/ISSM.2006.4493108 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings 364-367 2014-06-19T03:25:12Z 2014-06-19T03:25:12Z 2006 Conference Paper Ho, W.K.,Chen, X.,Wu, X.,Tay, A. (2006). Real-time monitoring of photoresist thickness contour in microlithography. IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings : 364-367. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/ISSM.2006.4493108" target="_blank">https://doi.org/10.1109/ISSM.2006.4493108</a> 9784990413804 1523553X http://scholarbank.nus.edu.sg/handle/10635/71568 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/ISSM.2006.4493108
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Ho, W.K. Chen, X. Wu, X. Tay, A.
format	Conference or Workshop Item
author	Ho, W.K. Chen, X. Wu, X. Tay, A.
spellingShingle	Ho, W.K. Chen, X. Wu, X. Tay, A. Real-time monitoring of photoresist thickness contour in microlithography
author_sort	Ho, W.K.
title	Real-time monitoring of photoresist thickness contour in microlithography
title_short	Real-time monitoring of photoresist thickness contour in microlithography
title_full	Real-time monitoring of photoresist thickness contour in microlithography
title_fullStr	Real-time monitoring of photoresist thickness contour in microlithography
title_full_unstemmed	Real-time monitoring of photoresist thickness contour in microlithography
title_sort	real-time monitoring of photoresist thickness contour in microlithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/71568
_version_	1681087407380758528

Real-time monitoring of photoresist thickness contour in microlithography

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