Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation

10.1016/j.egypro.2012.02.011

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Bibliographic Details
Main Authors: Liao, B., Aberle, A.G., Mueller, T., Verma, L.K., Danner, A.J., Yang, H., Bhatia, C.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72116
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-721162023-10-25T20:57:35Z Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation Liao, B. Aberle, A.G. Mueller, T. Verma, L.K. Danner, A.J. Yang, H. Bhatia, C.S. ELECTRICAL & COMPUTER ENGINEERING Electron beam lithography High aspect ratio Metallisation Silicon wafer solar cells Ultrafine fingers 10.1016/j.egypro.2012.02.011 Energy Procedia 15 91-96 2014-06-19T03:31:36Z 2014-06-19T03:31:36Z 2012 Conference Paper Liao, B., Aberle, A.G., Mueller, T., Verma, L.K., Danner, A.J., Yang, H., Bhatia, C.S. (2012). Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation. Energy Procedia 15 : 91-96. ScholarBank@NUS Repository. https://doi.org/10.1016/j.egypro.2012.02.011 18766102 http://scholarbank.nus.edu.sg/handle/10635/72116 000306068100011 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Electron beam lithography
High aspect ratio
Metallisation
Silicon wafer solar cells
Ultrafine fingers
spellingShingle Electron beam lithography
High aspect ratio
Metallisation
Silicon wafer solar cells
Ultrafine fingers
Liao, B.
Aberle, A.G.
Mueller, T.
Verma, L.K.
Danner, A.J.
Yang, H.
Bhatia, C.S.
Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
description 10.1016/j.egypro.2012.02.011
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Liao, B.
Aberle, A.G.
Mueller, T.
Verma, L.K.
Danner, A.J.
Yang, H.
Bhatia, C.S.
format Conference or Workshop Item
author Liao, B.
Aberle, A.G.
Mueller, T.
Verma, L.K.
Danner, A.J.
Yang, H.
Bhatia, C.S.
author_sort Liao, B.
title Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
title_short Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
title_full Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
title_fullStr Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
title_full_unstemmed Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
title_sort ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/72116
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