Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation

Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation

10.1016/j.egypro.2012.02.011

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Bibliographic Details
Main Authors: Liao, B., Aberle, A.G., Mueller, T., Verma, L.K., Danner, A.J., Yang, H., Bhatia, C.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Electron beam lithography
High aspect ratio
Metallisation
Silicon wafer solar cells
Ultrafine fingers
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72116
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/72116

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