Ultrafine and high aspect ratio metal lines by electron beam lithography for silicon solar cell metallisation

• Main Authors: Liao, B., Aberle, A.G., Mueller, T., Verma, L.K., Danner, A.J., Yang, H., Bhatia, C.S.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Electron beam lithography; High aspect ratio; Metallisation; Silicon wafer solar cells; Ultrafine fingers
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/72116
• Institution: National University of Singapore

10.1016/j.egypro.2012.02.011