Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices

International Symposium on IC Technology, Systems and Applications

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Main Authors:	Song, J., Chim, W.K., Chan, D.S.H., Pan, Y.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/72518
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-72518
record_format	dspace
spelling	sg-nus-scholar.10635-725182015-01-07T03:20:11Z Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices Song, J. Chim, W.K. Chan, D.S.H. Pan, Y. ELECTRICAL ENGINEERING International Symposium on IC Technology, Systems and Applications 8 156-158 2014-06-19T05:08:57Z 2014-06-19T05:08:57Z 1999 Conference Paper Song, J.,Chim, W.K.,Chan, D.S.H.,Pan, Y. (1999). Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices. International Symposium on IC Technology, Systems and Applications 8 : 156-158. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/72518 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	International Symposium on IC Technology, Systems and Applications
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Song, J. Chim, W.K. Chan, D.S.H. Pan, Y.
format	Conference or Workshop Item
author	Song, J. Chim, W.K. Chan, D.S.H. Pan, Y.
spellingShingle	Song, J. Chim, W.K. Chan, D.S.H. Pan, Y. Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
author_sort	Song, J.
title	Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
title_short	Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
title_full	Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
title_fullStr	Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
title_full_unstemmed	Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
title_sort	charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/72518
_version_	1681087580369584128

Charge trapping as the dominant degradation mechanism during plasma processing of 0.25 μm technology devices

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