Hot-carrier induced degradation mechanisms of 0.8μm LDD P-MOSFET with 850°C wet gate oxidation

Annual Proceedings - Reliability Physics (Symposium)

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Bibliographic Details
Main Author: Pan, Y.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72678
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Institution: National University of Singapore
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