Hot-carrier induced degradation mechanisms of 0.8μm LDD P-MOSFET with 850°C wet gate oxidation
Annual Proceedings - Reliability Physics (Symposium)
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Main Author: | Pan, Y. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/72678 |
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Institution: | National University of Singapore |
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