Spreading resistance profiling of ultrashallow junction NPN BJT, with carrier redistribution effect

Spreading resistance profiling of ultrashallow junction NPN BJT, with carrier redistribution effect

Proceedings of SPIE - The International Society for Optical Engineering

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Bibliographic Details
Main Authors: Tan, L.C.P., Tan, L.S., Leong, M.S.
Other Authors: ELECTRICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
BJT
Carrier redistribution effect
Dopant profile
Metallurgical junctions
On-bevel junctions
Spreading resistance profiling
Ultrashallow junctions
Online Access:http://scholarbank.nus.edu.sg/handle/10635/72938
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/72938

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