Spreading resistance profiling of ultrashallow junction NPN BJT, with carrier redistribution effect

• Main Authors: Tan, L.C.P., Tan, L.S., Leong, M.S.
• Other Authors: ELECTRICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: BJT; Carrier redistribution effect; Dopant profile; Metallurgical junctions; On-bevel junctions; Spreading resistance profiling; Ultrashallow junctions
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/72938
• Institution: National University of Singapore

Proceedings of SPIE - The International Society for Optical Engineering