Nanoindentation study of sputtered Al-Cu thin films for interconnect applications

10.1109/EPTC.2006.342774

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Bibliographic Details
Main Authors: Kumar, A., Jayaganthan, R., Chandra, R., Chawla, V., Tay, A.A.O.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73664
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-736642015-03-24T06:37:58Z Nanoindentation study of sputtered Al-Cu thin films for interconnect applications Kumar, A. Jayaganthan, R. Chandra, R. Chawla, V. Tay, A.A.O. MECHANICAL ENGINEERING 10.1109/EPTC.2006.342774 Proceedings of the Electronic Packaging Technology Conference, EPTC 560-564 2014-06-19T05:37:52Z 2014-06-19T05:37:52Z 2006 Conference Paper Kumar, A.,Jayaganthan, R.,Chandra, R.,Chawla, V.,Tay, A.A.O. (2006). Nanoindentation study of sputtered Al-Cu thin films for interconnect applications. Proceedings of the Electronic Packaging Technology Conference, EPTC : 560-564. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/EPTC.2006.342774" target="_blank">https://doi.org/10.1109/EPTC.2006.342774</a> 142440665X http://scholarbank.nus.edu.sg/handle/10635/73664 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1109/EPTC.2006.342774
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Kumar, A.
Jayaganthan, R.
Chandra, R.
Chawla, V.
Tay, A.A.O.
format Conference or Workshop Item
author Kumar, A.
Jayaganthan, R.
Chandra, R.
Chawla, V.
Tay, A.A.O.
spellingShingle Kumar, A.
Jayaganthan, R.
Chandra, R.
Chawla, V.
Tay, A.A.O.
Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
author_sort Kumar, A.
title Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
title_short Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
title_full Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
title_fullStr Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
title_full_unstemmed Nanoindentation study of sputtered Al-Cu thin films for interconnect applications
title_sort nanoindentation study of sputtered al-cu thin films for interconnect applications
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/73664
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