A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

Japanese Journal of Applied Physics, Part 2: Letters

Saved in:
Bibliographic Details
Main Authors: Lu, Y.-F., Song, W.-D., Ye, K.-D., Lee, Y.-P., Chan, D.S.H., Low, T.-S.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Adhesion force
Cleaning force
Cleaning model
Cleaning threshold
Laser cleaning
Particle removal
Quartz particle
Silicon substrate
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80270
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:Japanese Journal of Applied Physics, Part 2: Letters

Similar Items