A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface

Japanese Journal of Applied Physics, Part 2: Letters

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Bibliographic Details
Main Authors:	Lu, Y.-F., Song, W.-D., Ye, K.-D., Lee, Y.-P., Chan, D.S.H., Low, T.-S.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Adhesion force Cleaning force Cleaning model Cleaning threshold Laser cleaning Particle removal Quartz particle Silicon substrate
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80270
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Institution:	National University of Singapore

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