Characterization of rf-sputtered yttrium oxide films

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Main Authors:	Ling, C., Bhaskaran, J., Choi, W.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/80323
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-80323
record_format	dspace
spelling	sg-nus-scholar.10635-803232015-02-23T21:57:38Z Characterization of rf-sputtered yttrium oxide films Ling, C. Bhaskaran, J. Choi, W. ELECTRICAL ENGINEERING Vacuum 43 5-7 753-755 VACUA 2014-10-07T02:56:16Z 2014-10-07T02:56:16Z 1992-05 Article Ling, C.,Bhaskaran, J.,Choi, W. (1992-05). Characterization of rf-sputtered yttrium oxide films. Vacuum 43 (5-7) : 753-755. ScholarBank@NUS Repository. 0042207X http://scholarbank.nus.edu.sg/handle/10635/80323 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Vacuum
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Ling, C. Bhaskaran, J. Choi, W.
format	Article
author	Ling, C. Bhaskaran, J. Choi, W.
spellingShingle	Ling, C. Bhaskaran, J. Choi, W. Characterization of rf-sputtered yttrium oxide films
author_sort	Ling, C.
title	Characterization of rf-sputtered yttrium oxide films
title_short	Characterization of rf-sputtered yttrium oxide films
title_full	Characterization of rf-sputtered yttrium oxide films
title_fullStr	Characterization of rf-sputtered yttrium oxide films
title_full_unstemmed	Characterization of rf-sputtered yttrium oxide films
title_sort	characterization of rf-sputtered yttrium oxide films
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/80323
_version_	1681088866214215680

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