Characterization of rf-sputtered yttrium oxide films
Vacuum
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| المؤلفون الرئيسيون: | , , |
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| مؤلفون آخرون: | |
| التنسيق: | مقال |
| منشور في: |
2014
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| الوصول للمادة أونلاين: | http://scholarbank.nus.edu.sg/handle/10635/80323 |
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| المؤسسة: | National University of Singapore |
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sg-nus-scholar.10635-80323 |
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sg-nus-scholar.10635-803232024-11-09T00:15:45Z Characterization of rf-sputtered yttrium oxide films Ling, C. Bhaskaran, J. Choi, W. ELECTRICAL ENGINEERING Vacuum 43 5-7 753-755 VACUA 2014-10-07T02:56:16Z 2014-10-07T02:56:16Z 1992-05 Article Ling, C.,Bhaskaran, J.,Choi, W. (1992-05). Characterization of rf-sputtered yttrium oxide films. Vacuum 43 (5-7) : 753-755. ScholarBank@NUS Repository. 0042207X http://scholarbank.nus.edu.sg/handle/10635/80323 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| description |
Vacuum |
| author2 |
ELECTRICAL ENGINEERING |
| author_facet |
ELECTRICAL ENGINEERING Ling, C. Bhaskaran, J. Choi, W. |
| format |
Article |
| author |
Ling, C. Bhaskaran, J. Choi, W. |
| spellingShingle |
Ling, C. Bhaskaran, J. Choi, W. Characterization of rf-sputtered yttrium oxide films |
| author_sort |
Ling, C. |
| title |
Characterization of rf-sputtered yttrium oxide films |
| title_short |
Characterization of rf-sputtered yttrium oxide films |
| title_full |
Characterization of rf-sputtered yttrium oxide films |
| title_fullStr |
Characterization of rf-sputtered yttrium oxide films |
| title_full_unstemmed |
Characterization of rf-sputtered yttrium oxide films |
| title_sort |
characterization of rf-sputtered yttrium oxide films |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/80323 |
| _version_ |
1821194601433661440 |