Characterization of titanium silicide by Raman spectroscopy for submicron IC processing

Microelectronic Engineering

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Main Authors: Lim, E.H., Karunasiri, G., Chua, S.J., Shen, Z.X., Wong, H., Pey, K.L., Lee, K.H., Chan, L.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/80324
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-803242024-11-14T02:30:15Z Characterization of titanium silicide by Raman spectroscopy for submicron IC processing Lim, E.H. Karunasiri, G. Chua, S.J. Shen, Z.X. Wong, H. Pey, K.L. Lee, K.H. Chan, L. ELECTRICAL ENGINEERING PHYSICS Phase transformation Raman spectroscopy SALICIDE TiSi2 Microelectronic Engineering 43-44 611-617 MIENE 2014-10-07T02:56:16Z 2014-10-07T02:56:16Z 1998-08-01 Article Lim, E.H.,Karunasiri, G.,Chua, S.J.,Shen, Z.X.,Wong, H.,Pey, K.L.,Lee, K.H.,Chan, L. (1998-08-01). Characterization of titanium silicide by Raman spectroscopy for submicron IC processing. Microelectronic Engineering 43-44 : 611-617. ScholarBank@NUS Repository. 01679317 http://scholarbank.nus.edu.sg/handle/10635/80324 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Phase transformation
Raman spectroscopy
SALICIDE
TiSi2
spellingShingle Phase transformation
Raman spectroscopy
SALICIDE
TiSi2
Lim, E.H.
Karunasiri, G.
Chua, S.J.
Shen, Z.X.
Wong, H.
Pey, K.L.
Lee, K.H.
Chan, L.
Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
description Microelectronic Engineering
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
Lim, E.H.
Karunasiri, G.
Chua, S.J.
Shen, Z.X.
Wong, H.
Pey, K.L.
Lee, K.H.
Chan, L.
format Article
author Lim, E.H.
Karunasiri, G.
Chua, S.J.
Shen, Z.X.
Wong, H.
Pey, K.L.
Lee, K.H.
Chan, L.
author_sort Lim, E.H.
title Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
title_short Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
title_full Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
title_fullStr Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
title_full_unstemmed Characterization of titanium silicide by Raman spectroscopy for submicron IC processing
title_sort characterization of titanium silicide by raman spectroscopy for submicron ic processing
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/80324
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